The
51st International Field
Emission Symposium
June 29 – July 4, 2008 – Rouen, France
Outstanding Young Scientist Award
Tentative list of invited speakers
- Roger Alvis : FEI Company, USA
"Towards Routine Atom Probe Tomography Analysis of Microelectronic Thin-Film Devices"- Renaud Bachelot : UT Troyes, France
"Surface-Plasmon-Based Nano-Photochemistry"
- Thierry Epicier : MATEIS, Lyon, France
"High Resolution and 3D analysis in TEM : complementary tools to Atom probe Tomography"- Alain Fontaine : Director of the French nanoscience program, Grenoble, France
"C’Nanos and nanosciences"- Jacques Gierak : LPN CNRS, Marcoussis, France
"Exploration of the ultimate patterning potential achievable with focused ion beams "- Peter Hommelhoff : MPI für Quantenoptik, München, Germany
"Extreme localization of electrons in space and time"- Kazuhiro Hono : NIMS, Tsukuba, Japan
"Nanostructured metallic materials - designing materials by visualization of atoms using 3D atom probe"- Norbert Kruze : Brussels, Belgium
"Catalytic Surface Reactions on the Atomic Scale"- Isabelle Martin : Cameca, France
"Advances of Tomographic Atom Probe for nano-scale Materials analysis"- John Notte : Carl Zeiss SMT, Inc., Dresden, Germany
"An Introduction to the Helium Ion Microscope - A New Application of the Gas Field Ionization Source"- Razvan Stoian : Université Jean Monnet, Saint Etienne, France
"Particle emission from solids under the action of ultrashort and temporally tailored laser pulses"- Yuri Suchorski : Technische Universität Wien, Austria
"Electronic effects in catalytic reactions in nanosized reaction systems"- Wilfried Vandervorst : Imec and Dept. Physics, K.U. Leuven, Belgium
"Metrology for nano-electronics : challenges and solutions"
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Pictures of Rouen courtesy of C. Singh
